High School Residency: Studio 2

Fallingwater Education: High School Residency Studio 2

COVID-19 Update: For the safety of students and staff, High School Residency: Studio 2 will be presented as a Virtual Summer Camp during the summer of 2021. Studio materials will be provided by mail. Streaming-quality internet connection and device with video chat capability required.

High School Residency: Studio 2 is for students age 17 years or older who are preparing for admission to an architecture, design or art school. During the seven-day intensive skill building program, students will create original, portfolio-worthy work. This course is led by a licensed teaching architect, who will guide studio explorations that are comparable to a first-year studio foundation course, which is a typical requirement in undergraduate programs in architecture, design and visual art. Students will enjoy livestream access to Fallingwater and opportunities for reflective writing and sketching from observation.

Features

  • Livestream access to Fallingwater
  • Architecture and design exercises with hands-on projects inspired by Fallingwater
  • In-depth, scholarly discussions and applications of Wright's principles of organic architecture
  • Career awareness
  • Portfolio preparation

Eligibility

All students who are at least 17 years of age and have completed their junior or senior year in high school are eligible to apply. Students curious about architecture, design or visual art careers are strongly encouraged to apply. Enrollment is limited.

Application

Our application requires three examples of student work in 2D and/or 3D media. Images and descriptions of work samples may be submitted as pdf, doc, docx or jpg through the online application form.

Apply to High School Residency: Studio 2

For more information, contact Marie Woof, Fallingwater Institute program manager, at mwoof@paconserve.org.

Monday, July 26 to Sunday, August 1, 2021

Application due date is July 12, 2021

Tuition is $250 and includes materials sent by mail.